CVD and PVD Systems
JG-2DIA HF-CVD System
JG-3DIA HF-CVD System
JG1-CNT T-CVD System
JG1-CNT T-CVD System
JG1-CNT T-CVD System
JG-C PECVD System
Sputtering System
SY3c Co-sputtering System
SY6m Multi-sputtering System
SY6mp Multi-sputtering System
Ion Source
Hall Plasma Source
Magnetron sputter source
 
   

Our main system products are as follows

HF-CVD: Hot-filament chemical vapor deposition, used for polycrystalline diamond, nanodiamond and carbon nanotube film deposition.

T-CVD: thermal CVD system for carbon nanotube film deposition and heat treatment deposition.

PECVD: plasma enhanced CVD for aligned carbon nanotube, diamond-like carbon film deposition and plasma treatment. 

 


      

Co-sputtering: Confocal magnetron sputtering system for multi-laysers, alloy films, metal/oxides/nitride film deposition.

Multi-sputtering: multiple magnetron sputtering for multi-layers, especially for magnetic thin film deposition.


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We provide systems with high quality and competitive price
 
For detailed information, please contact us.